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ISO 17560:2014

ISO 17560:2014

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Surface chemical analysis — Secondary-ion mass spectrometry — Method for depth profiling of boron in silicon

Published By Publication Date Number of Pages
ISO 2014-09 18
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ISO 17560:2014 specifies a secondary-ion mass spectrometric method using magnetic-sector or quadrupole mass spectrometers for depth profiling of boron in silicon, and using stylus profilometry or optical interferometry for depth scale calibration. This method is applicable to single-crystal, poly-crystal, or amorphous silicon specimens with boron atomic concentrations between 1 × 1016 atoms/cm3 and 1 × 1020 atoms/cm3, and to crater depths of 50 nm or deeper.

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ISO 17560:2014
$19.50