ISO 21466:2019

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Microbeam analysis — Scanning electron microscopy — Method for evaluating critical dimensions by CD-SEM

Published By	Publication Date	Number of Pages
ISO	2019-12	54

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Categories: 37.020 - Optical equipment, ISO

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Description

This document specifies the structure model with related parameters, file format and fitting procedure for characterizing critical dimension (CD) values for wafer and photomask by imaging with a critical dimension scanning electron microscope (CD-SEM) by the model-based library (MBL) method. The method is applicable to linewidth determination for specimen, such as, gate on wafer, photomask, single isolated or dense line feature pattern down to size of 10 nm.

Additional information

Published Code	ISO
Published By	International Organization for Standardization
Publication Date	2019-12
Pages Count	54
Language	English
Edition	1
File Size	3.7 MB
ICS Codes	37.020 - Optical equipment

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ISO 21466:2019

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