ISO 23170:2022
$39.00
Surface chemical analysis — Depth profiling — Non-destructive depth profiling of nanoscale heavy metal oxide thin films on Si substrates with medium energy ion scattering
| Published By | Publication Date | Number of Pages |
| ISO | 2022-06 | 36 |
This document specifies a method for the quantitative depth profiling of amorphous heavy metal oxide ultrathin films on Si substrates using medium energy ion scattering (MEIS).
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