{"id":418665,"date":"2024-10-20T06:22:08","date_gmt":"2024-10-20T06:22:08","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bs-iso-171092022-tc\/"},"modified":"2024-10-26T11:53:30","modified_gmt":"2024-10-26T11:53:30","slug":"bs-iso-171092022-tc","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bs-iso-171092022-tc\/","title":{"rendered":"BS ISO 17109:2022 – TC"},"content":{"rendered":"
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
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38<\/td>\n | undefined <\/td>\n<\/tr>\n | ||||||
42<\/td>\n | Foreword <\/td>\n<\/tr>\n | ||||||
43<\/td>\n | Introduction <\/td>\n<\/tr>\n | ||||||
45<\/td>\n | 1 Scope 2 Normative references 3 Terms, definitions, symbols and abbreviated terms 3.1 Terms and definitions <\/td>\n<\/tr>\n | ||||||
46<\/td>\n | 3.2 Symbols and abbreviated terms 4 Requirement of single- and multi-layer reference thin films <\/td>\n<\/tr>\n | ||||||
47<\/td>\n | 5 Determination of sputtering rate <\/td>\n<\/tr>\n | ||||||
53<\/td>\n | Annex A (informative) Interlaboratory test report <\/td>\n<\/tr>\n | ||||||
64<\/td>\n | Annex B (informative) Prediction of the rates for a wide range of other materials through tabulated values of sputtering yields <\/td>\n<\/tr>\n | ||||||
65<\/td>\n | Bibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" Tracked Changes. Surface chemical analysis. Depth profiling. Method for sputter rate determination in X-ray photoelectron spectroscopy, Auger electron spectroscopy and secondary-ion mass spectrometry sputter dept profiling using single and multi-layer thin films<\/b><\/p>\n |