BS ISO 14606:2015
$142.49
Surface chemical analysis. Sputter depth profiling. Optimization using layered systems as reference materials
| Published By | Publication Date | Number of Pages |
| BSI | 2015 | 28 |
This International Standard gives guidance on the optimization of sputter-depth profiling parameters using appropriate single-layered and multilayered reference materials in order to achieve optimum depth resolution as a function of instrument settings in Auger electron spectroscopy, X-ray photoelectron spectroscopy and secondary ion mass spectrometry.
This International Standard is not intended to cover the use of special multilayered systems such as delta doped layers.
PDF Catalog
| PDF Pages | PDF Title |
|---|---|
| 6 | Foreword |
| 7 | Introduction |
| 9 | 1 Scope 2 Terms and definitions |
| 10 | 3 Symbols and abbreviated terms 4 Setting parameters for sputter depth profiling 4.1 General |
| 11 | 4.2 Auger electron spectroscopy |
| 12 | 4.3 X-ray photoelectron spectroscopy 4.4 Secondary ion mass spectrometry 5 Depth resolution at an ideally sharp interface in sputter depth profiles 5.1 Measurement of depth resolution |
| 13 | 5.2 Average sputtering rate 5.3 Depth resolution ∆z |
| 14 | 6 Procedures for optimization of parameter settings 6.1 Alignment of sputtered area with a smaller analysis area 6.1.1 General |
| 15 | 6.1.2 AES 6.1.3 XPS with a small probe (for example monochromator) 6.1.4 XPS with a large area source (for example without monochromator) 6.1.5 SIMS |
| 16 | 6.2 Optimization of parameter settings |
| 17 | Annex A (informative) Factors influencing the depth resolution |
| 19 | Annex B (informative) Typical single-layered systems as reference materials |
| 20 | Annex C (informative) Typical multilayered systems used as reference materials |
| 21 | Annex D (informative) Uses of multilayered systems |
| 22 | Bibliography |
