{"id":291525,"date":"2024-10-19T19:47:41","date_gmt":"2024-10-19T19:47:41","guid":{"rendered":"https:\/\/pdfstandards.shop\/product\/uncategorized\/bs-iso-147012018-tc\/"},"modified":"2024-10-25T16:50:12","modified_gmt":"2024-10-25T16:50:12","slug":"bs-iso-147012018-tc","status":"publish","type":"product","link":"https:\/\/pdfstandards.shop\/product\/publishers\/bsi\/bs-iso-147012018-tc\/","title":{"rendered":"BS ISO 14701:2018 – TC"},"content":{"rendered":"
PDF Pages<\/th>\n | PDF Title<\/th>\n<\/tr>\n | ||||||
---|---|---|---|---|---|---|---|
1<\/td>\n | compares BS ISO 14701:2018 <\/td>\n<\/tr>\n | ||||||
2<\/td>\n | TRACKED CHANGES Text example 1 \u2014 indicates added text (in green) <\/td>\n<\/tr>\n | ||||||
30<\/td>\n | National foreword <\/td>\n<\/tr>\n | ||||||
34<\/td>\n | Foreword <\/td>\n<\/tr>\n | ||||||
35<\/td>\n | Introduction <\/td>\n<\/tr>\n | ||||||
37<\/td>\n | 1 Scope 2 Normative references 3 Terms and definitions 4 Abbreviated terms and symbols 4.1 Abbreviated terms 4.2 Symbols <\/td>\n<\/tr>\n | ||||||
38<\/td>\n | 5 Outline of method <\/td>\n<\/tr>\n | ||||||
40<\/td>\n | 6 Method for measuring the oxide thickness 6.1 Cleaning and preparing the sample <\/td>\n<\/tr>\n | ||||||
41<\/td>\n | 6.2 Mounting the sample 6.3 Choosing spectrometer settings <\/td>\n<\/tr>\n | ||||||
44<\/td>\n | 6.4 Recording data <\/td>\n<\/tr>\n | ||||||
45<\/td>\n | 6.5 Measuring intensities <\/td>\n<\/tr>\n | ||||||
48<\/td>\n | 6.6 Calculating the oxide thickness <\/td>\n<\/tr>\n | ||||||
49<\/td>\n | 6.7 Calculating the uncertainty of the oxide thickness <\/td>\n<\/tr>\n | ||||||
51<\/td>\n | Bibliography <\/td>\n<\/tr>\n<\/table>\n","protected":false},"excerpt":{"rendered":" Tracked Changes. Surface chemical analysis. X-ray photoelectron spectroscopy. Measurement of silicon oxide thickness<\/b><\/p>\n |